Build in 2000-2001, regularly updated and new equipments added. Our cleanroom is designed for processing of polymer-based light-emitting diodes and photovoltaic cells.
The cleanroom consists of a wetstation for cleaning of glass substrates or IndiumTinOxide (ITO) substrates (in the back of the image above) and a glovebox processing street (on the left). The gloveboxes are equipped with a spin coating system (Suss) in a purge box and two vapor deposition systems in a regulated glovebox.
Both vapor deposition systems are controlled by a home-built, student-proof control panel. All metals, deposition methods and layer thicknesses are pre-programmed, which allows for excellent reproduction of the deposited layer.
The vapor deposition systems are home-built and specially designed for clean processing and they are equiped with scroll pumps and turbopumps, which ensure absolute oil-free processing. Both vapor-deposition systems have a temperature sensor to measure the substrate temperature during deposition to ensure that the substrate temperature is kept low.
Deposition system 1 is used for non-reactive metals such as Pd, Ag, and Au. Also deposition of Cr is possible as an adhesion layer.
Deposition system 2 is used for reactive metals such as Ca, Ba, Yt, Al, and LiF. This system is equiped with a gas analyzer and a rotating sample holder for a uniform deposition (e.g., 1 nm LiF).
A Dektak profilometer is used for measuring the layer thicknesses of the spin coated polymeric layers and/or the evaporated metals. The wetstation is used for cleaning substrates and includes ultrasonic baths, UV/ozone cleaner, oven, ultrapure (reverse osmosis 18.2 MΩ) water (200 Liters storage) and a spin coater for PEDOT:PSS. A small part of the wetstation is used for photolithography.
For photolithography used in Molecular electronics, we use a Suss Mask Aligner and an optical microscope. This mask aligner is mostly used in vacuum mode.
Measurement room ME-POS
Vapor deposition system for Au on mica with fully automated heating and degassing of Mica at 375 C, followed by automatic deposition of Au and slow cooling.
4-terminal measurement setup for Field-effect transistors and molecular electronics. Cooling till 190 K is possible with liquid N2.
Glovebox for I-V measurements. Equiped with halogen lamp and cooling system till 190 K.
Glovebox for I-V measurements. Equiped with halogen lamp ans solar simulator and cooling system till 190 K.
Scanning near-field optical microscope of WITEC. AFM and SNOM in one machine. Equiped with an avelange photodetector/spectrometer for single photon counting.
In-plane devices are measured at high vacuum and light emission can be measured with a microscope.