Molecular Electronics - Physics of Organic Semiconductors

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Cleanroom  ME-POS

Build in 2000-2001, regularly updated and new equipments added. Our cleanroom is designed for processing of polymer-based light-emitting diodes and photovoltaic cells.Cleanroom ME-POS


The cleanroom consists of a wetstation for cleaning of glass substrates or IndiumTinOxide (ITO) substrates (in the back of the image above) and a glovebox processing street (on the left). The gloveboxes are equipped with a spin coating system (Suss) in a purge box and two vapor deposition systems in a regulated glovebox.

spin coatingSpin box

 

 

 

 

 

Control panel deposition system

Both vapor deposition systems are controlled by a home-built, student-proof control panel. All metals, deposition methods and layer thicknesses are pre-programmed, which allows for excellent reproduction of the deposited layer. 

The vapor deposition systems are home-built and specially designed for clean processing and they are equiped with scroll pumps and turbopumps, which ensure absolute oil-free processing. Both vapor-deposition systems have a temperature sensor to measure the substrate temperature during deposition to ensure that the  substrate temperature is kept low. 

Evaporation system for non-reactive metals
Deposition system 1 is used for non-reactive metals such as Pd, Ag, and Au. Also deposition of Cr is possible as an adhesion layer.

 

Evaporation system for reactive metals
Deposition system 2 is used for reactive metals such as Ca, Ba, Yt, Al, and LiF. This system is equiped with a gas analyzer and a rotating sample holder for a uniform deposition (e.g., 1 nm LiF).

Dektak
wetstation

 

 

 

 

 


A Dektak profilometer is used for measuring the layer thicknesses of the spin coated polymeric layers and/or the evaporated metals. The wetstation is used for cleaning substrates and includes ultrasonic baths, UV/ozone cleaner, oven, ultrapure (reverse osmosis 18.2 MΩ) water (200 Liters storage) and a spin coater for PEDOT:PSS. A small part of the wetstation is used for photolithography. 

Optical Microscope
Photolithography Suss
 

 

 

 

 

 

For photolithography used in Molecular electronics, we use a Suss Mask Aligner and an optical microscope. This mask aligner is mostly used in vacuum mode.


  Measurement room ME-POS

 Flat gold deposition system at high temps
Vapor deposition system for Au on mica with fully automated heating and degassing of Mica at 375 C, followed by automatic deposition of Au and slow cooling.

             

FET setup
4-terminal measurement setup for Field-effect transistors and molecular electronics. Cooling till 190 K is possible with liquid N2.

Glovebox IV
Glovebox for I-V measurements. Equiped with halogen lamp and cooling system till 190 K.

 

Glovebox Solar Cells LEDS
Glovebox for I-V measurements. Equiped with halogen lamp ans solar simulator and cooling system till 190 K.

SNOM
Scanning near-field optical microscope of WITEC. AFM and SNOM in one machine. Equiped with an avelange photodetector/spectrometer for single photon counting.

 

In plane device and light emission
In-plane devices are measured at high vacuum and light emission can be measured with a microscope.

 
 
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Molecular Electronics - Physics of Organic Semiconductors - Design©2006 M. Kuik & J.J. Brondijk & B. de Boer